Show simple item record

dc.contributor.authorRennie, Michaelen
dc.date.accessioned2015-11-04T16:04:00Z
dc.date.available2015-11-04T16:04:00Z
dc.date.issued1996en
dc.identifier.urihttp://hdl.handle.net/1842/11294
dc.description.abstracten
dc.publisherThe University of Edinburghen
dc.subjectKB thesis scanning project 2015en
dc.titleCharacterisation of molecular nitrogen implanted silicon for multiple thicknesses of gate oxide in a 0.5um CMOS processen
dc.typeThesis or Dissertationen
dc.type.qualificationlevelDoctoralen
dc.type.qualificationnamePhD Doctor of Philosophyen


Files in this item

This item appears in the following Collection(s)

Show simple item record